SiO2 Thermal Oxide Filim khafiif ah Silicon wafer 4inch 6inch 8inch 12inch

Filimka SiO2 Khafiifka ah Thermal Oxide Silicon wafer 4inch 6inch 8inch 12inch image Featured

Sharaxaad Gaaban:

Waxaan ku siin karnaa heerkul sare superconducting substrate filim khafiif ah, filimada khafiifka ah magnetic iyo ferroelectric film substrate khafiif ah, semiconductor crystal, crystal indhaha, qalabka crystal laser, isla mar ahaantaana bixiyaan hanuuninta iyo jaamacadaha shisheeye iyo machadyada cilmi-baarista si ay u bixiyaan tayo sare leh (ultra siman, ultra). siman, ultra nadiif ah)

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Soo bandhigida sanduuqa waferka

Habka ugu muhiimsan ee wax soo saarka silikoon oksijiin ah sida caadiga ah waxaa ka mid ah tillaabooyinka soo socda: korriinka silikoon monocrystalline, gooynta maraqyada, dhalaalka, nadiifinta iyo oksaydhka.

Kobaca Silicon Monocrystalline: Marka hore, silikoon monocrystalline waxaa lagu koray heerkul sare hababka sida habka Czochralski ama habka Float-zone.Habkani wuxuu awood u siinayaa diyaarinta kiristaalo silikoon oo leh nadiif sare iyo daacadnimo.

Dicing: Silicon monocrystalline koray badanaa waa qaab cylindrical waxayna u baahan tahay in la gooyo maraqa khafiifka ah si loogu isticmaalo substrate wafer ahaan.Goynta waxaa badanaa lagu sameeyaa gooyeeyaha dheemanka.

Tooshka: Dusha maraqa la jarjaray waxa laga yaabaa in ay sinnayn oo ay u baahato polishing kiimiko-farsamo ah si loo helo dusha siman.

Nadiifinta: Waferka la nadiifiyey waa la nadiifiyaa si wasakhda iyo boodhka looga saaro.

Oxidizing: Ugu dambeyntii, maraqa silikoon waxaa lagu dhejiyaa foorno heerkul sare ah oo loogu talagalay daaweynta oksidaynta si loo sameeyo lakab ilaalin ah oo silikoon dioxide si loo hagaajiyo sifooyinka korantada iyo xoogga farsamada, iyo sidoo kale inay u adeegaan lakabka daboolka ee wareegyada isku dhafan.

Isticmaalka ugu muhiimsan ee waferrada silikoonka oksaydhka ah waxaa ka mid ah soo saarista wareegyada isku dhafan, soo saarista unugyada cadceedda, iyo soo saarida qalabka kale ee elektiroonigga ah.Waferrada Silicon oxide ayaa si weyn loogu isticmaalaa goobta qalabka semiconductor sababtoo ah sifooyinkooda farsamo ee aadka u fiican, cabbirka iyo xasiloonida kiimikada, awoodda ay ku shaqeeyaan heerkulka sare iyo cadaadiska sare, iyo sidoo kale ilaalinta wanaagsan iyo sifooyinka indhaha.

Faa'iidooyinka ay ka mid yihiin qaab-dhismeedka crystal dhamaystiran, Halabuurka kiimikada saafiga ah, cabbirka saxda ah, guryaha farsamo wanaagsan, iwm Tilmaamahan ka dhigi wafers silicon oxide gaar ahaan ku habboon soo saaridda ee waxqabadka sare wareegyada isku dhafan iyo qalabka kale ee microelectronic.