4 inch SiC Wafers 6H Semi-insulating SiC Substrates aasaasiga ah, cilmi-baarista, iyo fasalka dhumucda leh
Tilmaamaha Alaabta
Darajo | Wax-soo-saarka MPD eber (Grade Z) | Heerka Wax-soo-saarka (P Degree) | Fasalka Dhamaystiran (D Derajada) | ||||||||
Dhexroorka | 99.5 mm ~ 100.0 mm | ||||||||||
4H-SI | 500 μm±20 μm | 500 μm±25 μm | |||||||||
Hanuuninta Wafer |
Xagasha ka baxsan: 4.0° dhanka <1120> ±0.5° ee 4H-N | ||||||||||
4H-SI | ≤1cm-2 | ≤5 cm-2 | ≤15 cm-2 | ||||||||
4H-SI | ≥1E9 Ω·cm | ≥1E5 Ω·cm | |||||||||
Hanuuninta Flat Primary | {10-10} ±5.0° | ||||||||||
Dhererka Guriga aasaasiga ah | 32.5 mm± 2.0 mm | ||||||||||
Dhererka Guriga Sare | 18.0 mm± 2.0 mm | ||||||||||
Hanuuninta Guriga Sare | Silicon weji kor ah: 90° CW. laga bilaabo guri dabaq ah ± 5.0° | ||||||||||
Ka saarida gees | 3 mm | ||||||||||
LTV/TTV/Bow/Warp | ≤3 μm/≤5 μm/≤15 μm/≤30 μm | ≤10 μm/≤15 μm/≤25 μm/≤40 μm | |||||||||
Qalafsanaan | C waji | Polish | Ra≤1 nm | ||||||||
Si waji | CMP | Ra≤0.2 nm | Ra≤0.5 nm | ||||||||
Dildilaaca Cidhifyada Iftiinka Xoogan Sare | Midna | Dhererka isugeynta ≤ 10 mm, hal dhererka≤2 mm | |||||||||
Taarikada Hex By Iftiin Xoogan Sare | Aagga wadarta ≤0.05% | Aagga isugeynta ≤0.1% | |||||||||
Meelo Badan Oo Iftiin Xoogan Sare leh | Midna | Aagga isugeynta≤3% | |||||||||
Kaarboon Muuqaal ah | Aagga wadarta ≤0.05% | Aagga isugeynta ≤3% | |||||||||
Dusha sare ee Silikoon xoqida Iftiinka Xoogan Sare | Midna | Dhererka isugeynta≤1*dhexroorka wafer | |||||||||
Chips-ka Cidhifka Sare ee Iftiinka Xooga | Midna lama oggola ≥0.2mm ballac iyo qoto dheer | 5 waa la ogol yahay, ≤1 mm midkiiba | |||||||||
Wasakhaynta Silikoonka Dusha Sare ee Xooggiisa | Midna | ||||||||||
Baakadaha | Cassette Multi-wafer ah ama Konteenarka Waferka Keliya |
Jaantus faahfaahsan
Halkan ku qor fariintaada oo noo soo dir