SICOI (Silicon Carbide oo ku jira Insulator) Wafers SiC Film ON Silicon

Sharaxaad Gaaban:

Wafer-ka Silicon Carbide-ka ee Insulator-ka (SICOI) waa substrate-ka jiilka xiga ee semiconductor-ka kaas oo isku daraya sifooyinka sare ee jireed iyo elektaroonik ee silicon carbide (SiC) oo leh astaamaha go'doominta korantada ee heerka sare ee lakabka dahaarka leh, sida silicon dioxide (SiO₂) ama silicon nitride (Si₃N₄). Wafer-ka SICOI ee caadiga ah wuxuu ka kooban yahay lakab khafiif ah oo SiC ah, filim dahaar dhexdhexaad ah, iyo substrate saldhig taageero ah, kaas oo noqon kara silicon ama SiC.


Astaamaha

Jaantus Faahfaahsan

SICOI 11_副本
SICOI 14_副本2

Soo bandhigida Silicon Carbide ee ku jirta buskudka Insulator (SICOI)

Wafer-ka Silicon Carbide-ka ee Insulator-ka (SICOI) waa substrate-ka jiilka xiga ee semiconductor-ka kaas oo isku daraya sifooyinka sare ee jireed iyo elektaroonik ee silicon carbide (SiC) oo leh astaamaha go'doominta korantada ee heerka sare ee lakabka dahaarka leh, sida silicon dioxide (SiO₂) ama silicon nitride (Si₃N₄). Wafer-ka SICOI ee caadiga ah wuxuu ka kooban yahay lakab khafiif ah oo SiC ah, filim dahaar dhexdhexaad ah, iyo substrate saldhig taageero ah, kaas oo noqon kara silicon ama SiC.

Qaab-dhismeedkan isku-dhafka ah waxaa loo sameeyay si uu u daboolo baahiyaha adag ee aaladaha elektarooniga ah ee awoodda sare leh, kuwa soo noqnoqda sare leh, iyo kuwa heerkulka sare leh. Iyadoo lagu darayo lakab dahaadh ah, wafer-yada SICOI waxay yareeyaan awoodda dulinka waxayna xakameeyaan qulqulka daadashada, taasoo hubinaysa soo noqnoqoshada hawlgalka oo sareysa, hufnaan wanaagsan, iyo maaraynta kulaylka oo la hagaajiyay. Faa'iidooyinkani waxay ka dhigayaan kuwo aad qiimo u leh qaybaha sida baabuurta korontada ku shaqeeya, kaabayaasha isgaarsiinta 5G, nidaamyada hawada sare, elektaroonigga RF ee horumarsan, iyo teknoolojiyada dareemayaasha MEMS.

Mabda'a Wax Soo Saarka ee Wafers-ka SICOI

Waferada SICOI (Silicon Carbide on Insulator) waxaa lagu sameeyaa qaab casri ah.habka xidhitaanka iyo khafiifinta wafer-ka:

  1. Kobaca Substrate-ka SiC– Wafer SiC ah oo tayo sare leh (4H/6H) ayaa loo diyaariyey sidii agabka deeq-bixiyaha.

  2. Kala-soocidda Lakabka ee Dahaarka leh– Filim dahaadh ah (SiO₂ ama Si₃N₄) ayaa laga sameeyaa wafer-ka side-ka (Si ama SiC).

  3. Xidhitaanka Wafer-ka– Wafer-ka SiC iyo wafer-ka side-ka ayaa isku xiran marka heerkul sare ama balaasma la helo.

  4. Khafiifinta iyo Nadiifinta– Wafer-ka deeq-bixiyaha SiC waxaa loo yareeyaa dhowr micrometers ka dibna waa la safeeyaa si loo gaaro dusha siman ee atomiga.

  5. Kormeerka Kama Dambeysta ah– Wafer-ka SICOI ee la dhammeeyay waxaa lagu tijaabiyaa isku mid ahaanshaha dhumucda, qallafsanaanta dusha sare, iyo waxqabadka dahaarka.

Habkan dhexdiisa,lakabka SiC ee firfircoon ee khafiifka ahoo leh sifooyin koronto iyo kuleyl oo heer sare ah ayaa lagu daray filim dahaadh ah iyo substrate taageero ah, taasoo abuuraysa goob waxqabad sare leh oo loogu talagalay aaladaha korontada iyo RF ee jiilka soo socda.

SiCOI

Faa'iidooyinka Muhiimka ah ee Wafers-ka SICOI

Qaybta Astaanta Astaamaha Farsamada Faa'iidooyinka Muhiimka ah
Qaab-dhismeedka Qalabka Lakab firfircoon oo 4H/6H-SiC ah + filim dahaadh ah (SiO₂/Si₃N₄) + Side Side ama SiC Waxay gaartaa go'doomin koronto oo xooggan, waxayna yareysaa faragelinta dulinka
Sifooyinka Korontada Xoogga burburka sare (>3 MV/cm), luminta dielectric oo hooseysa Loogu habeeyay shaqada danab sare iyo mid soo noqnoqota sare leh
Sifooyinka Kulaylka Gudbinta kulaylka ilaa 4.9 W/cm·K, xasilloon oo ka sarreysa 500°C Kala firdhis kulayl oo wax ku ool ah, waxqabad aad u fiican marka la eego culeysyada kulul ee adag
Sifooyinka Farsamada Adkaanta daran (Mohs 9.5), isku-darka hoose ee ballaarinta kulaylka Ka hortagga walbahaarka, waxay kordhisaa cimriga qalabka
Tayada Dusha Sare Dusha sare oo aad u siman (Ra <0.2 nm) Waxay kor u qaadaysaa sameynta qalab aan cillad lahayn oo lagu kalsoonaan karo
Dahaarka Iska caabin >10¹⁴ Ω·cm, daadasho yar Hawlgal lagu kalsoonaan karo oo ku jira codsiyada go'doominta RF iyo danab sare
Cabbirka & Habaynta Waxaa laga heli karaa qaabab 4, 6, iyo 8-inji ah; Dhumucda SiC waa 1–100 μm; dahaarka waa 0.1–10 μm Naqshad dabacsan oo loogu talagalay shuruudaha kala duwan ee codsiga

 

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Meelaha Codsiga Muhiimka ah

Waaxda Codsiga Kiisaska Isticmaalka Caadiga ah Faa'iidooyinka Waxqabadka
Elektarooniga Korontada Qalabka korontada ku shaqeeya ee EV, saldhigyada dallacaadda, aaladaha korontada warshadaha Danab burbur sare, luminta beddelka oo yaraatay
RF & 5G Xoojiyaha korontada saldhigga saldhigga, qaybaha milimitir-hirarka Dulin yar, waxay taageertaa hawlgallada kala duwan ee GHz
Dareemayaasha MEMS Dareemayaasha cadaadiska deegaanka ee adag, MEMS-ka heerka navigation-ka Xasillooni heer sare ah oo kuleyl ah, oo u adkaysata shucaaca
Hawada Sare iyo Difaaca Isgaarsiinta dayax-gacmeedka, modules-ka awoodda hawo-mareenka Kalsoonida heerkulka daran iyo soo-gaadhista shucaaca
Shabakadda Caqliga Badan Beddelayaasha HVDC, jebinta wareegga adag Dahaarka sare wuxuu yareeyaa luminta korontada
Optoelectronics Nalalka UV, walxaha laysarka lagu dhejiyo Tayada sare ee kristalinta waxay taageertaa sii deynta iftiinka hufan

Samaynta 4H-SiCOI

Soo saarista wafers-ka 4H-SiCOI waxaa lagu gaaraa iyada oo loo marayohababka isku xidhka iyo khafiifinta wafer-ka, oo awood u siinaya is-dhexgalka dahaarka tayo sare leh iyo lakabyada firfircoon ee SiC ee aan cillad lahayn.

  • a: Shaxda sameynta madal 4H-SiCOI.

  • bSawirka wafer 4-inji ah oo 4H-SiCOI ah oo isticmaalaya isku xidhka iyo khafiifinta; aagagga cilladaha leh ee la calaamadeeyay.

  • c: Astaamaha isku-mid ahaanshaha dhumucda ee substrate-ka 4H-SiCOI.

  • d: Sawirka indhaha ee 4H-SiCOI.

  • eSocodka habka loo sameeyo qalabka wax lagu cabiro ee SiC microdisk resonator.

  • f: SEM oo ah resonator microdisk ah oo la dhammeeyay.

  • g: SEM la ballaariyay oo muujinaya dhinaca resonator-ka; qaybta AFM waxay muujinaysaa simanka dusha sare ee nanoscale.

  • h: SEM-ka isgoyska ah oo muujinaya dusha sare ee qaab parabolic ah.

Su'aalaha Badiya La Weydiiyo ee ku saabsan Wafers-ka SICOI

S1: Waa maxay faa'iidooyinka ay waferada SICOI ka leeyihiin waferada SiC ee dhaqameed?
A1: Si ka duwan substrates-ka caadiga ah ee SiC, wafer-yada SICOI waxay ka kooban yihiin lakab dahaadh ah oo yareeya awoodda dulinka iyo qulqulka daadashada, taasoo horseedaysa hufnaan sare, jawaab celin soo noqnoqosho oo wanaagsan, iyo waxqabad kuleyl oo heer sare ah.

S2: Cabbirrada kee baa badanaa la heli karaa?
A2: Wafer-yada SICOI waxaa badanaa lagu soo saaraa qaabab 4-inji ah, 6-inji ah, iyo 8-inji ah, iyadoo SiC-ga loo habeeyey iyo dhumucda lakabka dahaarka leh la heli karo iyadoo ku xiran shuruudaha qalabka.

S3: Waa maxay warshadaha ugu faa'iidada badan ee ka faa'iidaysta waferada SICOI?
A3: Warshadaha muhiimka ah waxaa ka mid ah elektarooniga korontada ee baabuurta korontada ku shaqeeya, elektarooniga RF ee shabakadaha 5G, MEMS ee dareemayaasha hawada sare, iyo optoelectronics sida UV LEDs.

S4: Sidee bay lakabka dahaarka leh u hagaajisaa waxqabadka qalabka?
A4: Filimka dahaarka leh (SiO₂ ama Si₃N₄) wuxuu ka hortagaa daadinta hadda jirta wuxuuna yareeyaa is-weydaarsiga korantada, taasoo suurtogalinaysa adkeysi koronto oo sarreeya, beddel hufan, iyo yareynta luminta kulaylka.

S5: Ma yihiin buskudka SICOI ee ku habboon isticmaalka heerkulka sare?
J5: Haa, iyadoo leh kuleyl sare iyo iska caabin ka baxsan 500°C, wafer-yada SICOI waxaa loogu talagalay inay si kalsooni leh u shaqeeyaan kulayl daran iyo jawi adag.

S6: Ma la habeyn karaa buskudka SICOI?
J6: Dabcan. Soosaarayaashu waxay bixiyaan naqshado loogu talagalay dhumuc gaar ah, heerarka daawada, iyo isku-darka substrate-ka si loo daboolo baahiyaha cilmi-baarista iyo warshadaha kala duwan.


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